History |
|
|
 |
|
NANO-MASTER, USA was founded in 1992 as a wholly-owned subsidiary of
NANO-MASTER, S.A., France, a leading metrology company in defect
inspection and high speed overlay measurement. Subsequent to the closing
down of Nano-Master S.A. in 1993, Dr. Birol Kuyel took over the
ownership of NANO-MASTER, USA. Later, the name was changed to
NANO-MASTER, Inc., which has now become a 100% privately owned US
company.
NANO-MASTER started design and development of research tools in 2001 and
focused on thin film applications. The first tool was a Sputtering
System followed by a PECVD System and later a Wafer Cleaner System was
delivered.
NANO-MASTER products are used in Semiconductor, MEMS, Optoelectronics,
Nanotechnology and Photovoltaic applications. Some of the products are
PECVD Systems for deposition of SiO2, Si3N4, DLC and CNT; PA-MOCVD
Systems for InGaN and AlGaN; Sputtering Systems (reactive,
co-sputtering, combinatorial); Thermal and E-Beam Evaporators, Ion Beam
Etching and Reactive Etching Systems; Atomic Layer Deposition Tools;
Megasonic Cleaning Systems and Photoresist Stripping Equipment.
In less than ten years NANO-MASTER has
established itself as a thin film equipment supplier around the world
and sold over 100 units in 20
countries primarily to universities, research centers and leading
national laboratories.
Birol Kuyel, Ph.D. is the president and CEO of NANO-MASTER, Inc. His
background expands to broad range of technologies including High
Temperature Plasma Physics, Turbulence, Si3N4 Film Deposition and
Characterization, X-ray Source Development, DUV Source Development, DUV
Step and Scan Lithography Tool Development (SEMATECH) and the
Lithography Cost of Ownership Model (SEMATECH). He has been awarded 9
patents and published numerous papers.
NANO-MASTER employs highly skilled and educated design and manufacturing
engineers, application engineers, service engineers and support
personnel.
NANO-MASTER’s objective is to provide top quality services while
maintaining the highest levels of integrity at all times
|
| |
|
|
|
