Wafer/Mask Cleaners

Sputtering Systems

Etching Systems

PECVD Systems

Thermal Evaporators

Heated Platens

Ultra-Pure Processing

Plasma Processing

Pulsed DC Controllers

Optical Sensors

Capacitve Sensors

CLEARANCE

nano-master SPUTTER COATERS

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NSC-2000

 

NSC-3000

Models:

NSC-2000 PLC controlled table top multi-gun sputtering system

NSC-3000 PC controlled table top multi-gun sputtering system

NSC-4000 PC controlled, stand-alone multi-gun sputtering system

 

Applications:

All types of metal and dielectric coating on wafers, ceramics, glass blanks, and disk heads

Optical coatings with ion sources

Hard coatings with Pulse DC power supplies

Reactive sputtering with RF plasma discharge

Description:

The Sputter Coater NSC 4000 and 3000 are PC controlled, stand-alone systems with water cooled rotating 8" substrate platen; NSC 2000 is a PLC controlled table-top sputtering system. Stainless steel and aluminum chambers are available. The system is pumped with a turbomolecular pump, and within 15-20 minutes a low 10-6 torr pressure can be reached. The system is also equipped with up to three 2" or 3" planar magnetrons. The RF or DC power is applied to the individual magnetron through a RF switch followed by a manual RF tuner. A manual or stepper motor driven shutter, which protects the unused magnetron during sputtering, is available as an option. The magnetron and substrate distance is adjustable to control uniformity and deposition rate, and the magnetron targets are easily replaceable. An optional thickness monitor is also included.

Related links:

High Temperature Platens

Pulsed DC Power Controllers for biasing

IWATA Dry Scroll Pumps  

 

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NSC-4000

Automated NSC-4000 with Load-Lock and Elevator

 

Combinatorial Sputtering

 

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