Dual Chamber Systems

Dual Chamber System

Dual Chamber Systems

Any combination of two systems; ALD, Sputtering, Evaporation, Ion Beam Milling or Etching, RIE, PECVD found in the NM catalog can be configurated as dual system. Cost is cut by sharing pumping systems and power supplies when applicable. The chambers are isolated from each other via gate valves and can be pumped and vented individually. Load lock or in vacuum chamber-to-chamber transfer is available.

  • 26"x44" footprint with enclosed panels ideal for clean rooms
  • Fully automatic PC based, recipe driven
  • LabVIEW user interface
  • EMO protection and safety interlocks
Ion Beam and PVD Dual System

Ion Beam and PVD

PECVD and Sputtering Dual System

PECVD and Sputtering

PECVD and RIE Dual System


Ion Beam and PVD Dual System

RIE and Sputtering