Hybrid PECVD/PEALD System

Hybrid PECVD/PEALD Systems

The NANO-MASTER NLP-4000 is a stand-alone hybrid PECVD/PEALD system for performing plasma-enhanced atomic layer deposition (PEALD) as well as plasma-enhanced chemical vapor deposition (PECVD). Both processes can be performed in a single chamber without any mechanical reconfiguration. It is also capable of depositing a stack of layers of PEALD/PECVD in the same process. It is CE and SEMI Standards-compliant and capable of processing up to 8” wafers. The system is controlled with LabVIEW software and features three-level password-controlled user authorization using a touch-screen monitor. The system is fully automated, safety-interlocked, recipe-driven, with status indicators and graphic and alphanumeric displays.

  • 13" Ni-plated Al chamber w/ heated chamber wall
  • 5x10-7 Torr base pressure attained with turbo pumping package
  • ICP plasma source
  • High surface ALD filter at the chamber exhaust
  • Level precursor distribution
  • Platen: Up to 400°C, biasable with RF, handles up to 8" wafers
  • Load Lock: Automatic load and unload
  • MFC's with electropolished gas lines and pneumatic shut-off valves
  • Fully automated PC based, recipe driven
  • LabVIEW user interface
  • EMO protection and safety interlocks
  • Provision for 150cc bubblers for Si or Ga for depositing PEVCD films.
  • Seperate gas pod for reactive/toxic gasses with gas leak sensors
  • Metallization and Gate Stack
  • GaN G-HEMT Transistor
  • Supercapacitor
  • Power Electronics
  • Gas Permeation Barrier
  • Solar Cell Applications
PECVD/PEALD Uniformity Data


Download PECVD/PEALD System Brochure