Roll-to-Roll Atomic Layer Deposition

ALD R2R

ALD R2R System

Roll-to-Roll Atomic Layer Deposition

The roll-to-roll (R2R) plasma-enhanced atomic layer deposition (PEALD) system is designed for the continous processing of flexible substrates and inline multilayer ALD coating on glass panels. The system addresses the need for high-throughput, uniform, and conformal thin film dpeosition on flexible materials, which is critical for applications such as flexible electronics, displays, barrier coatings, and panels. NANO-MASTER's patented continuous flow process doubles the throughput of traditional ALD systems.


A few key advantages of roll-to-roll PEALD are:

  • Continous processing: The R2R configuration allows for uninterrupted deposition, which significantly increases throughput compared to batch processess.
  • Uniform thin films: The combination of PEALD with R2R ensures highly uniform and conformal coatings, even on substrates with complex topographies.
  • Scalability: The system is designed to be scalable for industrial applications, facilitating the mass production of components.
  • Reduced thermal need: PEALD enables thim film deposition at lower temperatures, mkaing it suitable for temperature-sensitive flexible substrates.

    • Roll-to-roll substrate handling
    • ECR enhanced hollow cathode source
    • Onboard precursor delivery w/ fast pulse delivery valves
    • Fully automated PC based, recipe driven
    • Computer controlled safety interlocks
    • LabVIEW user interface
    • Options
    • Flexible electronics
    • Barrier coatings for packaging
    • Photovoltaic cells
    • Sensors and actuators
    ALD Data

    ALD Data