Hybrid PAALE/PEALD
Hybrid PAALE/PEALD System
Hybrid PAALE/PEALD Systems
The NANO-MASTER NLE-4000 is a stand-alone hybrid PAALE/PEALD system for performing plasma-enhanced atomic layer deposition (PEALD) as well as plasma-assisted atomic layer etching (PAALE). Both processes can be performed in a single chamber without any mechanical reconfiguration. It is CE and SEMI Standards-compliant. The system is controlled with LabVIEW software and features three-level password-controlled user authorization using a touch-screen monitor. The system is fully automated, safety-interlocked, recipe-driven, with status indicators and graphic and alphanumeric displays.
- 13" Ni-plated Al chamber w/ heated chamber wall
- 2x10-6 Torr base pressure attained with turbo pumping package
- Planar ICP plasma source
- High surface ALD filter at the chamber exhaust
- Level precursor distribution
- Platen: Up to 400°C, biasable with RF, handles up to 8" wafers
- MFC's with electropolished gas lines and pneumatic shut-off valves
- Fully automated PC based, recipe driven
- LabVIEW user interface
- EMO protection and safety interlocks
- Seperate gas pod for reactive/toxic gasses with gas leak sensors
- Up to seven 50cc precursor cylinders
- Precise etching of native oxide
- Power Electronics
- Etching 2-D Materials
