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Nano-Master, Inc. NEE-4000 Electron Beam Evaporation
Systems come in a dual chamber configuration consisting of the main
chamber where platen is located and a secondary chamber for housing the
e-beam source. This configuration with a gate valve between two chambers
may be used as a load lock to keep the e-beam source pockets in vacuum
while substrate is loaded and unloaded from the main chamber substrate
holder or platen. On other applications where automatic loading and
unloading of wafers is needed, it can be achieved through a third load
lock chamber that may be attached to the left face of the cube.
Co-evaporation capability with multiple e-beam sources and ability to
program compositions or compositional gradients through PC control can
be provided.
Features:
• Sequential or Co-Evaporation
• Dual E-Beam Source
• Multi-Pocket E-Gun
• Programmable Beam Scan
• 10 KW Switching Power Supply
• Turbomolecular
Pump, 10-7
Torr
• Manual Load/Unload w/Load Lock
• Auto Load/Unload
• Easy Material and Liner Change
• Crystal Thickness Monitor
• PC Controlled with LabVIEW
• Recipe Driven, Password Protected
• Fully Safety Interlocked |
